Applications of Plasma Processes to VLSI Technology
Author | : Takuo Sugano |
Publisher | : Wiley-Interscience |
Total Pages | : 426 |
Release | : 1985-09-24 |
ISBN-13 | : UOM:39015031778361 |
ISBN-10 | : |
Rating | : 4/5 ( Downloads) |
Download or read book Applications of Plasma Processes to VLSI Technology written by Takuo Sugano and published by Wiley-Interscience. This book was released on 1985-09-24 with total page 426 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents state-of-the-art research in microelectronic processing for very large scale integration. Emphasizing applications and techniques, this book provides considerable insight into Japan's technological effort in this important area of science. Focuses on research involving plasma deposition and dry etching. Considerable attention is devoted to MOS gate fabrication, the studies of the influence of process parameters on electrical properties, dry processing technologies, and the theory of plasma chemical reactions.