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ALD of Copper and Copper Oxide Thin Films for Applications in Metallization Systems of ULSI Devices
Language: en
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ALD of Copper and Copper Oxide Thin Films for Applications in Metallization Systems of ULSI Devices

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Categories:
Type: BOOK - Published: 2008 - Publisher:

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Thin Films of Copper Oxide and Copper Grown by Atomic Layer Deposition for Applications in Metallization Systems of Microelectronic Devices
Language: en
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Thin Films of Copper Oxide and Copper Grown by Atomic Layer Deposition for Applications in Metallization Systems of Microelectronic Devices

Authors: Thomas Wächtler
Categories:
Type: BOOK - Published: 2010 - Publisher: Thomas Waechtler

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Thin Films of Copper Oxide and Copper Grown by Atomic Layer Deposition for Applications in Metallization Systems of Microelectronic Devices
Language: en
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Thin Films of Copper Oxide and Copper Grown by Atomic Layer Deposition for Applications in Metallization Systems of Microelectronic Devices

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Type: BOOK - Published: 2006 - Publisher:

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Copper-based multi-level metallization systems in today's ultralarge-scale integrated electronic circuits require the fabrication of diffusion barriers and cond
Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications
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Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications

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In Advanced ULSI interconnects – fundamentals and applications we bring a comprehensive description of copper-based interconnect technology for ultra-lar- sca
Modeling and Characterization of Electromigration Failures in IC Metallization Systems and Copper Metallization for ULSI Applications
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Modeling and Characterization of Electromigration Failures in IC Metallization Systems and Copper Metallization for ULSI Applications

Authors: Jiang Tao
Categories:
Type: BOOK - Published: 1995 - Publisher:

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